chromium silicon sputtering target

Product Description: Chromium Silicon Sputtering Target

Introduction

Our high-quality Chromium Silicon Sputtering Target is specifically engineered for advanced sputtering applications in the semiconductor, photovoltaic, and optical industries. With unparalleled purity and performance, this target ensures consistent deposition of thin films for a range of high-tech applications, delivering reliable results in manufacturing processes where precision is key.

If you are looking for more details, kindly visit Advanced Targets.

Key Specifications:

• Material Composition: Chromium (Cr) & Silicon (Si) with varying purity levels (up to 99.995%)
• Dimensions: Customized sizes available (e.g., 100mm, 150mm, or 200mm diameter)
• Weight: Approximately 1.5 - 4.0 kg, depending on diameter
• Target Thickness: Standard thickness of 6mm, customizable per request

Unique Features

• High Purity Levels: Our targets are manufactured under stringent quality controls to ensure minimal contamination.
• Exceptional Durability: Designed for high-performance applications, offering extended life cycles in sputtering processes.
• Customizable Options: Available in various sizes and thicknesses to meet diverse customer requirements.
• Quality Assurance: Each target undergoes rigorous testing to guarantee optimal performance.

Technical Attributes

• Type: Chromium Silicon Alloy, combining the benefits of both metals for enhanced film adhesion and optical properties.
• Special Features: Engineered for compatibility with various sputtering systems, ensuring seamless integration and operation.
• Efficiency: High deposition rates, allowing for faster production cycles and improved manufacturing throughput.

Performance

Our Chromium Silicon Sputtering Target delivers exceptional efficiency and speed in film deposition processes, reducing downtime and enhancing productivity. Users can expect consistent quality and improved yield in the applied thin-film technologies.

If you want to learn more, please visit our website Advanced Targets.

Problem Solving

The Chromium Silicon Sputtering Target addresses common challenges faced in high-tech manufacturing environments, such as film uniformity and material durability. By utilizing our advanced targets, users will experience reduced wear and tear on their equipment, leading to lower maintenance costs and improved operational efficiency. Experience enhanced performance and reliability that solves your thin-film deposition needs and elevates your production capabilities.

Choose our Chromium Silicon Sputtering Target for a dependable and high-performance solution in your industrial applications. Contact us today for more information or to request a quote!

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